In-situ plasma cleaner for SEM, FIB, XPS, ALD, EUVL, and other high vacuum chambers. - iMag

In-situ plasma cleaner for SEM, FIB, XPS, ALD, EUVL, and other high vacuum chambers.

In-situ plasma cleaner for SEM, FIB, XPS, ALD, EUVL, and other high vacuum chambers.

SEMI-KLEEN and EM-KLEEN series remote plasma cleaners were based on the high efficiency inductively coupled plasma (ICP) discharge technology developed at the Lawrence Berkeley National Laboratory. Our patent-pending Turbo Discharge™ technology further improves the plasma strength by as much as 3X compared with traditional ICP discharge technology.

Typical applications:

In-situ sample cleaning for FE-SEM, FIB, and TEM
Contamination removal for semiconductor equipment, such as CD-SEM, EBR, EBI, EUVL
High vacuum chamber cleaning to remove water, hydrocarbon, and fluorocarbon contamination, reduce the pump-down time
Sample cleaning for XPS, SIMS, AES
Sample cleaning for ALD and epi-growth after organic solvent cleaning

EM-KLEEEN in-situ plasma cleaner installed on Zeiss Gemini SEM — Plasma cleaner for Zeiss Gemini SEM

EM-KLEEN downstream plasma cleaner for ThermoFisher (FEI) SEM and FIB system. — EM-KLEEN on Thermo Fisher (FEI) SEM/FIB

EM-KLEEN in-situ plasma cleaner installed on JEOL FESEM — EM-KLEEN for JEOL FE-SEM

EM-KLEEN plasma cleaner for Hitachi FESEM — EM-KLEEN on Hitachi SEM

EM-KLEEN in-situ plasma cleaner for TESCAN SEM and FIB — Plasma cleaner for TESCAN SEM/FIB

SEMI-KLEEN remote plasma source for XPS equipment — Plasma cleaner for XPS system

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